The stability of dihalides of $\mathrm{Si}, \mathrm{Ge}, \mathrm{Sn}$ and $\mathrm{Pb}$ increases steadily…

The stability of dihalides of $\mathrm{Si}, \mathrm{Ge}, \mathrm{Sn}$ and $\mathrm{Pb}$ increases steadily in the sequence
  1. $\mathrm{GeX}_2 \ll \mathrm{SiX}_2 \ll \mathrm{SnX_2} \ll \mathrm{PbX}_2$
  2. $\mathrm{SiX}_2 \ll \mathrm{GeX}_2 \ll \mathrm{PbX}_2 \ll \mathrm{SnX}{ }_2$
  3. $\mathrm{SiX}_2 \ll \mathrm{GeX}_2 \ll \mathrm{SnX}_2 \ll \mathrm{PbX}_2$
  4. $\mathrm{PbX}_2 \ll \mathrm{SnX}_2 \ll \mathrm{GeX}_2 \ll \mathrm{SiX}_2$

Solution

Due to inert pair effect, the stability of $+2$ oxidation state increases as we move down this group. $\therefore \mathrm{SiX}_2 \ll \mathrm{GeX}_2 \ll \mathrm{SnX}{ }_2 \ll \mathrm{PbX}_2$ Hence, (C) is correct.

Asked in: JEE Main 2007

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