Pure Si at $500 \mathrm{~K}$ has equal number of electron $\left(n_e\right)$ and hole $\left(n_h\right)$…
Pure Si at $500 \mathrm{~K}$ has equal number of electron $\left(n_e\right)$ and hole $\left(n_h\right)$ concentrations of $1.5 \times 10^{16} \mathrm{~m}^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22} \mathrm{~m}^{-3}$. The doped semiconductor is of
$n$-type with electron concentration $n_e=5 \times 10^{22} \mathrm{~m}^{-3}$
$p$-type with electron concentration $n_e=2.5 \times 10^{10} \mathrm{~m}^{-3}$
n-type with electron concentration $n_e=2.5 \times 10^{23} \mathrm{~m}^{-3}$
p-type having electron concentration $n_e=5 \times 10^9 \mathrm{~m}^{-3}$